Hwf6630-10 Tank-Type Chemical Vapor Deposition Furnace

The HWF6630-10 tank vapor deposition furnace is designed for medium-temperature heat treatment of electronic products. It performs vapor phase reaction processes in nitrogen, acetylene, and hydrogen atmospheres, and can also be used for sintering processes under protective atmospheres. Equipped with a real-time computer monitoring system, this furnace is ideal for material process testing in research environments.

• Model: HWF6630-10
• Effective Chamber Size: Φ600×300mm (D×H)
• Heating Element: Internal heating with stainless steel heating tubes
• Processing Atmosphere: Nitrogen, Hydrogen, Acetylene
• Heating Method: FEC ceramic fiber heater
• Temperature Control Points: 2
• Temperature Stability: ±1°C, with PID parameter self-tuning function
• Control Method: Touch screen + PLC centralized control
• Alarm Protection: Audible and visual alarms for overtemperature and thermocouple breakage
• Heating Power: 16kW
• Power Requirements: 3-phase 5-wire, 220/380V, 50Hz
• External Dimensions: 1185×1745×1780mm (W×H×D)

About Hefei Chitherm Equipment Co., Ltd.

As an advanced equipment supplier, we specialize in R&D, manufacturing, and sales of industrial and laboratory furnaces. Our product range includes bell furnaces, box furnaces, vacuum furnaces, tube furnaces, and more, serving industries such as advanced ceramics, electronic components, powder metallurgy, and new energy applications.